The Carbon Ion Energy Measurement in Pulse Filtered Cathodic Vacuum Arc Plasma Source for Study the Influence of Negative Substrate Bias Voltage
Abstract
This research is concerned with the process of measuring carbon ion energy from the pulse-filtered cathodic vacuum arc plasma source with the graphite as the cathode by using a retarding field ion energy analysis probe. To study the influence of a negative voltage biasing on carbon ion energy. The substrate was applied negative bias voltage from 0 to -80 V. To study the ion energy during the arc pulse plasma. The Time-resolved technique was used to measure carbon ion energy, with a time resolution of the order of 450 microseconds. The delay time for measuring the ion energy was adjusted from 0, 200, 400, 600, 800, and 1000 microseconds after arc ignition. The experimental result was found that the carbon ion energy in the arc plasma was dependent on substrate bias voltage, the carbon ion energy averages 20 eV when the substrate was biased at 0 V or grounded substrate. The carbon ion energy will be increased as the negative voltage bias to the substrate was increasing, where the carbon ion energy is 100 eV when the substrate was biased -80 V. The results show that the ion energy does not change with the arc pulse width and the ion energy is 20 eV at the grounded surface. The ion density changed with the arc pulse width, the ion density increased from 2.19x1016 m-3 for the first 450 microseconds up to 4.65x1016 m-3 for 450 to 1000 microseconds of the pulse width, and the ion density was decreased to zero for the end of the pulse width. Keywords : pulsed filtered cathodic vacuum arc ; time-resolved technique ; retarding field analysis ; pulse widthReferences
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measuring techniques. Journal of Applied Physics, 96(2), pp. 970–974.
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distributions and nonlinear. Journal of Physics D: Applied Physics, 43, 335201(1-13).
Chabert, P., & Braithwaite N. St. J. (2011). A retarding field analyser (RFA). Physics of Radio-Frequency Plasmas,
Cambridge: Cambridge University Press, p.348.
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microstructural characteristics of ultrathin carbon films (<2 nm). Tribology International, 81, pp. 73–88.
Kaeppelin, V., Carrère, M., & Layet, J-M. (2002). Ion energy distribution functions and Langmuir probe
measurements in low pressure argon discharges. Journal of Vacuum Science & Technology A: Vacuum,
Surfaces, and Films, 20(2), pp. 526–529.
Kutzner, J., & Miller, H. C. (1992). Integrated ion flux emitted from the cathode spot region of a diffuse vacuum arc. Journal of Physics D: Applied Physics, 25(4), pp. 687–693.
Tay, B. K., Zhao, Z. W., & Chua, D. H. C. (2006). Review of metal oxide films deposited by filtered cathodic vacuum arc technique. Materials Science and Engineering R: Reports, 52(1–3), pp. 1–48.
Van De Ven, T. H. M., Meijere, C. A. de, Horst, R. M. van der, Kampen, M.van, Banine, V. Y., & Beckers, J. (2018). Analysis of retarding field energy analyzer transmission by simulation of ion trajectories. Review of
Scientific Instruments, 89(4). pp. 043501-(1-11)
Yushkov, G. Y., Anders, A., Oks, E. M., & Brown, I. G. (2000). Ion velocities in vacuum arc plasmas. Journal of Applied Physics, 88(10), pp. 5618–5622.
Journal of Physics D: Applied Physics, 31(5), pp. 584–587.
Anders, A. (2010). A structure zone diagram including plasma-based deposition and ion etching. Thin Solid Films, 518(15), pp. 4087–4090.
Anders, A., & Oks, E. (2007). Charge-state-resolved ion energy distribution functions of cathodic vacuum arcs:
A study involving the plasma potential and biased plasmas. Journal of Applied Physics, 101(4).
pp. 043304(1-6)
Anders, A., & Yushkov, G. Y. (2002). Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field. Journal of Applied Physics, 91(8), pp. 4824–4832.
Anders, A., & Yushkov, G. Y. (2004). The kinetic energy of carbon ions in vacuum arc plasmas: A comparison of
measuring techniques. Journal of Applied Physics, 96(2), pp. 970–974.
Baloniak, T., Reuter, R., & Keudell, A. V. (2010). Fundamental aspects of substrate biasing: ion velocity
distributions and nonlinear. Journal of Physics D: Applied Physics, 43, 335201(1-13).
Chabert, P., & Braithwaite N. St. J. (2011). A retarding field analyser (RFA). Physics of Radio-Frequency Plasmas,
Cambridge: Cambridge University Press, p.348.
Chen, F. F. (2003). Lecture Notes on Langmuir Probe Diagnostics. Mini-Course on Plasma Diagnostics, IEEE- ICOPS Meeting, (23-35). Electrical Engineering Department, University of California, Los Angeles
Ehiasarian, A. P., Munz, W.-D., Hultman, L., Helmersson, U., & Petrov, I. (2003). High power pulsed magnetron sputtered CrNx films. Surface and Coatings Technology, 94(6), pp. 267-272.
Ehrhardt, H. (1995). New developments in the field of superhard coatings. Surface and Coatings Technology,
74–75(PART 1), pp. 29–35.
Goohpattader, P. S., Dwivedi, N., Rismani-Yazdi, E., Satyanarayana, N., Yeo, R. J., Kundu, S., & Bhatia, C.S. (2015). Probing the role of C+ ion energy, thickness and graded structure on the functional and
microstructural characteristics of ultrathin carbon films (<2 nm). Tribology International, 81, pp. 73–88.
Kaeppelin, V., Carrère, M., & Layet, J-M. (2002). Ion energy distribution functions and Langmuir probe
measurements in low pressure argon discharges. Journal of Vacuum Science & Technology A: Vacuum,
Surfaces, and Films, 20(2), pp. 526–529.
Kutzner, J., & Miller, H. C. (1992). Integrated ion flux emitted from the cathode spot region of a diffuse vacuum arc. Journal of Physics D: Applied Physics, 25(4), pp. 687–693.
Tay, B. K., Zhao, Z. W., & Chua, D. H. C. (2006). Review of metal oxide films deposited by filtered cathodic vacuum arc technique. Materials Science and Engineering R: Reports, 52(1–3), pp. 1–48.
Van De Ven, T. H. M., Meijere, C. A. de, Horst, R. M. van der, Kampen, M.van, Banine, V. Y., & Beckers, J. (2018). Analysis of retarding field energy analyzer transmission by simulation of ion trajectories. Review of
Scientific Instruments, 89(4). pp. 043501-(1-11)
Yushkov, G. Y., Anders, A., Oks, E. M., & Brown, I. G. (2000). Ion velocities in vacuum arc plasmas. Journal of Applied Physics, 88(10), pp. 5618–5622.
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2022-01-10
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