Influence of Sputtering Power and Nitrogen Gas Flow Rate on Properties of Titanium Aluminum Nitride Thin Film Deposited by Reactive DC Magnetron Sputtering
Abstract
TiAlN thin films were deposited on silicon substrate by reactive DC magnetron sputtering. Influences of sputtering power and nitrogen gas flow rate on structural and mechanical properties of TiAlN thin film were investigated. The crystal structure, morphology and surface roughness were studied by XRD, FE-SEM and AFM, respectively. Moreover, elemental composition and hardness of TiAlN thin film were analized by EDX and nanoindentation, respectively. The result showed that crystal structure was found and morphology was promoted texture with triangle when increasing nitrogen gas flow rate from 0.6 to 1.0 sccm. Increasing sputtering power at nitrogen gas flow rate of 1.0 sccm exhibited decrease crystallinity, crystallite size, lattice constant and surface roughness. The best condition of TiAlN thin film was TAN2 due to elemental composition ratio of (Ti+Al):N about 50:50 showed highest hardness of 13.26 GPa. The obtained hardness of TiAlN thin film was similar to TiN film because elemental composition of Ti more than Al of 2.25 times. Keywords : TiAlN ; sputtering ; sputtering power ; elemental composition ; hardnessReferences
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Chaiyakun, S., Somwangsakul, A., Buranawong, A., Kaewkhao, J., & Witit-anun, N. (2013). Effect of N2 flow rates on properties of nanostructured TiAlN thin films prepared by reactive magnetron co-sputtering. 770, 161-164.
Jalali, R., Parhizkar, M., Bidadi, H., Naghshara, H., & Hosseini, S. (2015). Effect of Al content, substrate temperature and nitrogen flow on the reactive magnetron co-sputtered nanostructure in TiAlN thin films intended for use as barrier material in DRAMs. Korean Physical Society, 66(6), 978-983.
Ljungcrantz, H., Oden, M., Hultman, L., Greene, J.E., & Sundgren, J.E. (1996). Nanoindentation studies of single crystal (001), (011), and (111) oriented TiN layers on MgO. Applied Physics, 80(12), 6725-6733.
Mei, F., Shao, N., Wei, L., & Li, G. (2005). Effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered (Ti,Al)N coatings. Materials Letters, 59(17), 2210-2213.
McIntyre, D., Greene, J.E., Hakansson, G., Sundgren, J.E., & Munz, W.D. (1990). Oxidation of metastable single phase polycrystalline Ti0.5Al0.5N films: kinetics and mechanisms. Applied Physics, 67(3), 1542-1553.
Somwangsakun, A. (2013). Preparation and characterization of titanium aluminum nitride thin film deposited by reactive DC magnetron co-sputtering method. Master of science in physics, Faculty of science, Burapha university. (in Thai)
Shugurov, A., & Kazachenok, M. (2018). Mechanical properties and tribological behavior of magnetron sputtered TiAlN/TiAl multilayer coatings. Surface and Coatings Technology, 353, 254-262.
Shew, B., & Huang, J. (1995). The effects of nitrogen flow on reactively sputtered Ti-Al-N films. Surface and Coatings Technology, 71, 30-63.
Schramm, I.C., Pauly, C., Joesaar, M.P., Slawik, S., Suarez, S., Mucklich, F., & Oden, M. (2017). Effects of nitrogen vacancies on phase stability and mechanical properties of arc deposited (Ti0.52Al0.48)Ny (y < 1) coatings. Surface and Coatings Technology, 330, 77-86.
Wuhrer, R., & Yeung, W.Y. (2002). A study on the microstructure and property development of D.C magnetron co-sputtered ternary titanium aluminum nitride coatings: Part III effect of substrate bias voltage and temperature. Materials science, 37, 1993-2004.
Xiao, W., Deng, H., Zou, S., Ren, Y., Tang, D., Lei, M., Xiao, C., Zhou, X., & Chen, X. (2018). Effect of roughness of substrate and sputtering power on the properties of TiN coatings deposited by magnetron sputtering. Nuclear Materials, 509, 542-549.
Alarcon, L., Casados, D.A., Romero, S., Fernández, M., Alvarez, J., & Haro-Poniatowski, E. (2013). Effect of aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive crossed beam pulsed laser deposition. Applied Surface Science, 283, 808-812.
Barshilia, H.C., Prakash, M., Jain, A., & Rajam, K.S. (2005). Structure hardness and thermal stability of TiAlN and nanolayered TiAlN/CrN multilayer films. Vacuum, 77, 169–179.
Chu, K., Shum, P.W., & Shen, Y.G. (2006). Substrate bias effects on mechanical and tribological properties of substitutional solid solution (Ti,Al)N films prepared by reactive magnetron sputtering. Materials Science & Engineering: B, 131, 62-71.
Chaiyakun, S., Somwangsakul, A., Buranawong, A., Kaewkhao, J., & Witit-anun, N. (2013). Effect of N2 flow rates on properties of nanostructured TiAlN thin films prepared by reactive magnetron co-sputtering. 770, 161-164.
Jalali, R., Parhizkar, M., Bidadi, H., Naghshara, H., & Hosseini, S. (2015). Effect of Al content, substrate temperature and nitrogen flow on the reactive magnetron co-sputtered nanostructure in TiAlN thin films intended for use as barrier material in DRAMs. Korean Physical Society, 66(6), 978-983.
Ljungcrantz, H., Oden, M., Hultman, L., Greene, J.E., & Sundgren, J.E. (1996). Nanoindentation studies of single crystal (001), (011), and (111) oriented TiN layers on MgO. Applied Physics, 80(12), 6725-6733.
Mei, F., Shao, N., Wei, L., & Li, G. (2005). Effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered (Ti,Al)N coatings. Materials Letters, 59(17), 2210-2213.
McIntyre, D., Greene, J.E., Hakansson, G., Sundgren, J.E., & Munz, W.D. (1990). Oxidation of metastable single phase polycrystalline Ti0.5Al0.5N films: kinetics and mechanisms. Applied Physics, 67(3), 1542-1553.
Somwangsakun, A. (2013). Preparation and characterization of titanium aluminum nitride thin film deposited by reactive DC magnetron co-sputtering method. Master of science in physics, Faculty of science, Burapha university. (in Thai)
Shugurov, A., & Kazachenok, M. (2018). Mechanical properties and tribological behavior of magnetron sputtered TiAlN/TiAl multilayer coatings. Surface and Coatings Technology, 353, 254-262.
Shew, B., & Huang, J. (1995). The effects of nitrogen flow on reactively sputtered Ti-Al-N films. Surface and Coatings Technology, 71, 30-63.
Schramm, I.C., Pauly, C., Joesaar, M.P., Slawik, S., Suarez, S., Mucklich, F., & Oden, M. (2017). Effects of nitrogen vacancies on phase stability and mechanical properties of arc deposited (Ti0.52Al0.48)Ny (y < 1) coatings. Surface and Coatings Technology, 330, 77-86.
Wuhrer, R., & Yeung, W.Y. (2002). A study on the microstructure and property development of D.C magnetron co-sputtered ternary titanium aluminum nitride coatings: Part III effect of substrate bias voltage and temperature. Materials science, 37, 1993-2004.
Xiao, W., Deng, H., Zou, S., Ren, Y., Tang, D., Lei, M., Xiao, C., Zhou, X., & Chen, X. (2018). Effect of roughness of substrate and sputtering power on the properties of TiN coatings deposited by magnetron sputtering. Nuclear Materials, 509, 542-549.
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2022-02-18
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