Influence of Nitrogen Flow Rate on Properties of TiAlN Thin Film Prepared by Reactive DC Magnetron Sputtering
Abstract
In this paper, Titanium aluminium nitride (TiAlN) thin films were deposited on Si substrates by reactive DC magnetron sputtering. The effects of nitrogen gas flow rates on the crystal structure, surface morphology, surface roughness, and hardness of TiAlN films were characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), atomic force microscope (AFM) and nanoindenter test, respectively. Target voltage was increased as a function of nitrogen gas flow rates and it indicated that transition mode was found in the range of 0.4-0.8 sccm while compound mode was found over 0.8 sccm. The XRD result showed that crystal structure of TiAlN thin films was found for nitrogen flow rates of 1.3 and 2.0 sccm with prefer orientation of (200) plane. Moreover, crystallinity, crystalline size, and surface roughness were enhanced via increasing nitrogen flow rates. Hardness of TiAlN thin films was improved from 10.28 to 14.99 GPa with increasing nitrogen flow rates from 0.4 to 2.0 sccm, respectively, corresponding with crystallinity. In addition, elemental composition ratio of TiAlN thin films was confirmed by energy dispersive X-ray spectroscopy (EDS) technique. It was found that elemental composition ratio of N/(Ti+Al) and Ti/Al were 1.17 and 2.3 for nitrogen flow rates of 2.0 sccm. These variables were important for the crystal structure and hardness. The resulting hardness was more similar to TiN than TiAlN because the prepared film has twice atomic proportion of titanium than aluminum. Keywords : TiAlN thin film ; N2 gas flow rate ; sputtering ; elemental compositionReferences
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aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive
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AlN Films on Mo Electrodes for Electro-Acoustic Devices. In IEEE International Ultrasonics Symposium
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Applied Surface Science, 431, 160-164.
Li, K., Jin, H., Wang, D., & Tang, Y. (2009). Preparation of AlN thin films for film bulk acoustic resonator
application by radio frequency sputtering. Journal of Zhejiang University SCIENCE A, 10(3), 464-470.
Lin, Y.W., Huang, J.H., & Yu, G.P. (2010). Effect of nitrogen flow rate on properties of nanostructured TiZrN thin
films produced by radio frequency magnetron sputtering. Thin Solid Films, 518, 7308-7311.
Liu, G.T., Duha, J.G., Chung, K.H., & Wang, J.H. (2005). Mechanical characteristics and corrosion behavior of
(Ti,Al)N coatings on dental alloys. Surface and Coatings Technology, 200(7), 2100-2105.
Mei, F., Shao, N., Wei, L., & Li, G. (2005). Effect of N2 partial pressure on the microstructure and mechanical
properties of reactively sputtered (Ti,Al)N coatings. Materials Letters, 59, 2210-2213.
Musil, J., Barocha, P., Vlcek, J., Nam, K.H., & Han, J.G. (2005). Reactive magnetron sputtering of thin films :
present status and trends. Thin Solid Films, 475, 208-218.
Shew, B.Y., Huang, J.L., & Lii, D.F. (1997). Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of
TiAlN films. Thin Solid Films, 293, 212-219.
Somwangsakun, A., Buranawong, A., Witit-anun, N., & Chaiyakun, S. (2012). Preparation and characterization of
titanium aluminium nitride thin film deposited by reactive DC co-unbalanced magnetron sputtering
method. In The 9th National Kasetsart University Kamphaeng Saen Conference. (482-489). Kasetsart
University. (in Thai)
Wang, X., Zhang, K., Yue, G., Peng, D., Qi, Z., & Wang, Z. (2011). Investigation on the structure and properties of
TiAlN coatings deposited by dc reactive magnetron sputtering. Advanced Materials Research, 154-155,
1639-1642.
Journal of Ceramic Processing Research, 14(4), 529-534.
Arif, M., & Eisenmenger, S.C. (2017). In situ assessment of target poisoning evolution in magnetron sputtering.
Surface and Coatings Technology, 324, 345-352.
Chakrabarti, K., Jeong, J.J., Hwang, S.K., Yoo, Y.C., & Lee, C.M. (2002). Effects of nitrogen flow rates on the
growth morphology of TiAlN films prepared by an rf-reactive sputtering technique. Thin Solid Films,
406, 159–163.
Chen, J.T., Wang, J., Zhang, F., Zhang, G.A., Fan, X.Y., Wu, Z.G., & Yan, P.X. (2009). Characterization and
temperature controlling property of TiAlN coatings deposited by reactive magnetron co-sputtering.
Journal of Alloys and Compounds, 472, 91-96.
Danisman, S., & Savas, S. (2014). Relation between coating parameters and structural and mechanical properties
of magnetron sputtered TiAlN coatings. Arabian Journal for Science and Engineering, 39, 5025–5034.
Devia, D.M., Restrepo, P.E., Arango, P.J., Tschiptschin, A.P., & Velez, J.M. (2011). TiAlN coatings deposited by
triode magnetron sputtering varying the bias voltage. Applied Surface Science, 257, 6181-6185.
Escobar, L.A., Solís-Casados, D.A., Romero, S., Fernández, M., Pérez, J.A., & Haro, E.P. (2013). Effect of
aluminum plasma parameters on the physical properties of Ti-Al-N thin films deposited by reactive
crossed beam pulsed laser deposition. Applied Surface Science, 283, 808-812.
Felmetsger, V.V., Laptey, P.N., & Tanner, S.M. (2008). Crystal Orientation and Stress in AC Reactively Sputtered
AlN Films on Mo Electrodes for Electro-Acoustic Devices. In IEEE International Ultrasonics Symposium
Proceedings. Beijing : China.
Gao, F., Li, G., & Xia, Y. (2017). Influence of hysteresis effect on properties of reactively sputtered TiAlSiN films.
Applied Surface Science, 431, 160-164.
Li, K., Jin, H., Wang, D., & Tang, Y. (2009). Preparation of AlN thin films for film bulk acoustic resonator
application by radio frequency sputtering. Journal of Zhejiang University SCIENCE A, 10(3), 464-470.
Lin, Y.W., Huang, J.H., & Yu, G.P. (2010). Effect of nitrogen flow rate on properties of nanostructured TiZrN thin
films produced by radio frequency magnetron sputtering. Thin Solid Films, 518, 7308-7311.
Liu, G.T., Duha, J.G., Chung, K.H., & Wang, J.H. (2005). Mechanical characteristics and corrosion behavior of
(Ti,Al)N coatings on dental alloys. Surface and Coatings Technology, 200(7), 2100-2105.
Mei, F., Shao, N., Wei, L., & Li, G. (2005). Effect of N2 partial pressure on the microstructure and mechanical
properties of reactively sputtered (Ti,Al)N coatings. Materials Letters, 59, 2210-2213.
Musil, J., Barocha, P., Vlcek, J., Nam, K.H., & Han, J.G. (2005). Reactive magnetron sputtering of thin films :
present status and trends. Thin Solid Films, 475, 208-218.
Shew, B.Y., Huang, J.L., & Lii, D.F. (1997). Effects of r.f. bias and nitrogen flow rates on the reactive sputtering of
TiAlN films. Thin Solid Films, 293, 212-219.
Somwangsakun, A., Buranawong, A., Witit-anun, N., & Chaiyakun, S. (2012). Preparation and characterization of
titanium aluminium nitride thin film deposited by reactive DC co-unbalanced magnetron sputtering
method. In The 9th National Kasetsart University Kamphaeng Saen Conference. (482-489). Kasetsart
University. (in Thai)
Wang, X., Zhang, K., Yue, G., Peng, D., Qi, Z., & Wang, Z. (2011). Investigation on the structure and properties of
TiAlN coatings deposited by dc reactive magnetron sputtering. Advanced Materials Research, 154-155,
1639-1642.
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2021-09-06
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