Effect of Sputtering Current on the Structure of Titanium Nitride Thin Film Deposited by Reactive DC Magnetron Sputtering
Abstract
Nano-crystalline titanium nitride (TiN) thin films were deposited on silicon wafer and glass slides substrates by reactive DC magnetron sputtering technique. The effect of the sputtering current, in the range of 300 - 700 mA, on the structure of the as-deposited films was investigated. The as-deposited thin films were characterized by several techniques. The crystal structure was characterized by GI-XRD technique. The thickness, microstructure and surface morphologies were evaluated by FE-SEM technique. The chemical composition was measured by EDS technique. The film’s color was measured by the UV-Vis spectrophotometer. The results showed that the as-deposited TiN thin films had face center cubic (fcc) structure with the planes of (111), (200), (220), and (311). The lattice constant was in the range of 4.241 - 4.245 Å. The as-deposited thin films exhibited a nanostructure with a crystal size of less than 65 nm.The thickness and crystallite size were increased as the sputtering current was increased. The results showed that the thickness was varied from 412 nm to 1202 nm and the crystallite size were found from 37.0 nm to 64.3 nm. The as-deposited thin films composed of titanium and nitrogen in different ratios depending on the sputtering current. Cross section analysis by FE-SEM technique showed a compact columnar structure of the as-deposited thin films. The color of the as-deposited film was measured in CIE L*a*b* system was varied with the sputtering current. The as-deposited film which deposited from the high sputtering current, in the range of 500 - 700 mA, was close to the color of 24K gold. Keywords : thin films, titanium nitride, reactive sputtering, magnetron sputtering, sputtering currentReferences
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Barhai, P.K., Kumari, N., Banerjee, I., Pabi, S.K. & Mahapatra, S.K. (2010). Study of the effect of plasma current density on the formation of titanium nitride and titanium oxynitride thin films prepared by reactive DC magnetron, Vacuum, 84, 896-901.
Cheng, H.E., & Wen, Y.W. (2004). Correlation between process parameters, microstructure and hardness of titanium nitride films by chemical vapor deposition. Surface and Coatings Technology, 179, 103-109.
Choeysuppaket, A., Chaiyakun, S., & Rattana, T. (2018). Effect of tungsten sputtering current on structural and morphological properties of WC thin films. SNRU Journal of Science and Technology, 10(1), 82-86.
Chou, W.J., Yu, G.P., & Huang, J.H. (2001). Deposition of TiN thin films on Si(100) by HCD ion plating. Surface and Coatings Technology, 140, 206-214.
Farooq, M., & Lee, Z.H. (2002). Optimizations of the sputtering process for deposition composite thin films. Journal of the Korean Physical Society, 40(3), 511-515.
Jeyachandran, Y.L., Narayandass, S.K., Mangalaraj, D., Areva, S., & Mielczarski, J.A. (2007). Properties of titanium nitride films prepared by direct current magnetron sputtering. Materials Science and Engineering: A, 445-446, 223–236.
Kim, T.S., Park, S.S., & Lee, B.T. (2005). Characterization of nano-structured TiN thin films prepared by R.F. magnetron sputtering. Materials Letter, 59(29-30), 3929-3932.
Lim, J.W., Park, J.S., & Kang, S.W. (2000). Kinetic modeling of film growth rates of TiN films in atomic layer deposition. Journal of Applied Physics, 87, 4632-4634.
Luo, Q., Yang, S., & Cook, K.E. (2013). Hybrid HIPIMS and DC magnetron sputtering of TiN coatings: deposition rate, structure and tribological properties. Surface and Coatings Technology, 236, 13-21.
Musil, J., Baroch, P., Vlcek, J., Nam, K.H. & Han, J.G. (2005). Reactive magnetron sputtering of thin films: present status and trends. Thin Solid Film, 475, 208–218.
Niyomsoan, S., Grant, W., Olson, D.L., & Misha, B. (2002). Variation of color in titanium and zirconium nitride decorative thin films. Thin Solid Films, 415, 187–194.
Nose, M., Zhoub, M., Honboc, E., Yokotaa, M., & Saji,S. (2001). Colorimetric properties of ZrN and TiN coatings prepared by DC reactive sputtering. Surface and Coatings Technology, 142-144, 211-217.
Okimura, K., (2001). Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering. Surface and Coatings Technology, 135, 286-290.
Shi, P.Z., Wang, J., Tian, C.X., Li, Z.G., Zhang, G.D., Fu, D.J., & Yang, B. (2013). Structure, mechanical and tribological properties of CrN thick coatings deposited by circular combined tubular arc ion plating. Surface and Coatings Technology, 288, S534-S537.
Thornton, J.A., (1978). Substrate heating in cylindrical magnetron sputtering sources. Thin Solid Films, 54(1),
23-31.
Vaz, F., Cerqueira, P., Rebouta, L., Nascimento, S.M.C., Alves, E., Goudeau, Ph., Rivie`re, J.P., Pischow, K. &
de Rijk, J. (2003). Structural, optical and mechanical properties of coloured TiNxOy thin films. Thin Solid Films, 447–448, 449–454.
Yokota, K., Nakamura, K., Kasuya, T., Tamura, S., Sugimoto, T., Akamatsu, K., Nakao, K., & Miyashita, F. (2002). Relationship between hardness and lattice parameter for TiN films deposited on SUS 304 by an IBAD technique. Surface and Coatings Technology, 158-159, 690-693.
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2020-01-17
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บทความวิจัยจากการประชุมวิชาการระดับชาติ"วิทยาศาสตร์วิจัย"ครั้งที่ 11
