Structural and Oxidation behavior of TiN Thin Films Deposited Using Reactive DC Magnetron Sputtering Technique
Abstract
The structural and oxidation behavior of TiN thin films, grown by reactive DC magnetron sputtering technique was studied. To evaluate crystal structure and oxidation behavior of coated samples, annealing with the different temperature in the range of 500 - 1000 °C were conducted. After annealing, the films were characterized using X-ray Diffractometer (XRD), Energy Dispersive X-ray Spectroscopy (EDS) and Field-Emission Scanning Electron Microscope (FE-SEM). The XRD resulted revealed that the formation oxidation which TiO2 rutile phase diffraction peak appear from 600 °C and the intensity of oxide increased gradually with temperature. The aggregation of grain increased with temperature were observed from FE-SEM. The cross-sectional results showed that the thin dense oxide over layer was present at 500 oC and the oxide thickness increased gradually with temperature. Meanwhile, underneath TiN grain grew above 500 oC and become more void structure after annealing at 700 °C. The oxygen content was found at 500 oC and the evolution of Ti, N and O with different elements compositions at various annealing temperatures were investigated from EDS technique. The oxidation rate was found to depend strongly on annealing temperature. The oxidation activation energy of 44.54 kJ/mol was obtained. Keywords : oxidation, TiN, sputteringReferences
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Ibrahim, K., Rahman, M., Zhao, X., Vedere, J.P., Zhou, Z.F., Mohammadpou, E., Majeed, R.H., Nikoloski, A.N.
and Jiang, Z.T. (2018). Annealing effects on microstructural, optical, and mechanical properties of sputtered CrN thin film coatings: Experimental studies and finite element modeling. Journal of Alloys
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Jafari, A., Ghoranneviss, Z., Elahi, S., Ghoranneviss, M., Yazdi, F. and Rezaei, A. (2015). Effects of Annealing
on TiN Thin Film Growth by DC Magnetron Sputtering. Advances in Mechanical Engineering, 2014, 1-6.
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Surface and Coatings Technology, 206, 3283-3290.
Logothetidis, S., Meletis, E.I., Stergioudis, G. and Adjaottor, A.A. (1999). Room temperature oxidation behavior
of TiN thin films. Thin Solid Films, 338, 304-313.
Niyomsoan, S., Grant, W., Olson D.L. and Mishra, B (2002). Variation of color in titanium and zirconium nitride decorative thin films. Thin Solid Films, 415, 187-194.
Omrani M., Habibi M. & Amrollahi, R. (2012). Coating of titanium nitride on stainless steel targets by a 4 kJ
plasma focus device. Journal of Fusion Energy, 31, 401-404.
Otani, Y. and Hofmann, S. (1996). High temperature oxidation behavior of (Ti1-xCrx)N coatings. Thin Solid Films, 287, 188-192.
Popovic´, M., Novakovic´, M. and Bibic´. N. (2015). Annealing effects on the properties of TiN thin films. Processing and Application of Ceramics, 9, 67-71.
Qi, Z.B., Liu, B., Wu, Z,T., Zhu, F.P., Wang, Z.C. and Wu, C.H. (2013). A comparative study of the oxidation behavior of Cr2N and CrN coating. Thin Solid Films, 544, 515-520.
Wittmer, M., Noser, N. and Melchior, H. (1981). Oxidation kinetics of TiN thin films. Journal of Applied Physics,
52, 6659-6664.
Chen, H.Y. and Lu, F.H. (2006). Oxidation behavior of chromium nitride films. Thin Solid Films, 515, 2179-2184.
Chim, Y.C., Ding, X.Z., Zeng, X.T. and Zhang, S. (2009). Oxidation resistance of TiN, CrN, TiAlN and CrAlN coatings deposited by lateral rotating cathode arc. Thin Solid Films, 517, 4845-4849.
Cullity, B.D. and Stock, S.R. (2001). Elements of X-Ray Diffraction. New Jersey: Prentice Hall.
Gong, C., Zhang J., Yan C., Cheng X., Zhang J., Yu L., Jin Z. and Zhang, Z. (2012). Synthesis and microwave properties of nanosized titanium nitride. Journal of Materials Chemistry. 22(8), 3370-3376.
Hones, P., Zakri, C., Schmid, P.E., Lévy, F. and Shojae, O.R. (2000). Oxidation resistance of protective coatings studied by spectroscopic ellipsometry. Applied Physics Letters, 76, 3194-3196.
Huang, J.H., Yu, K.J., Sit, P. and Yu, G.P. (2006). Heat treatment of nanocrystalline TiN films deposited by unbalanced magnetron sputtering. Surface and Coatings Technology, 200, 4291-4299.
Huber, E. and Hofmann, S. (1994). Oxidation behaviour of chromium-based nitride coatings. Surface and Coatings Technology, 68-69, 64-69.
Ibrahim, K., Rahman, M., Zhao, X., Vedere, J.P., Zhou, Z.F., Mohammadpou, E., Majeed, R.H., Nikoloski, A.N.
and Jiang, Z.T. (2018). Annealing effects on microstructural, optical, and mechanical properties of sputtered CrN thin film coatings: Experimental studies and finite element modeling. Journal of Alloys
and Compounds, 750, 451-464.
Jafari, A., Ghoranneviss, Z., Elahi, S., Ghoranneviss, M., Yazdi, F. and Rezaei, A. (2015). Effects of Annealing
on TiN Thin Film Growth by DC Magnetron Sputtering. Advances in Mechanical Engineering, 2014, 1-6.
Lin, J., Zhang, N., Sproul, W.D. and Moore, J.J. (2012). A comparison of the oxidation behavior of CrN films deposited using continuous dc, pulsed dc and modulated pulsed power magnetron sputtering.
Surface and Coatings Technology, 206, 3283-3290.
Logothetidis, S., Meletis, E.I., Stergioudis, G. and Adjaottor, A.A. (1999). Room temperature oxidation behavior
of TiN thin films. Thin Solid Films, 338, 304-313.
Niyomsoan, S., Grant, W., Olson D.L. and Mishra, B (2002). Variation of color in titanium and zirconium nitride decorative thin films. Thin Solid Films, 415, 187-194.
Omrani M., Habibi M. & Amrollahi, R. (2012). Coating of titanium nitride on stainless steel targets by a 4 kJ
plasma focus device. Journal of Fusion Energy, 31, 401-404.
Otani, Y. and Hofmann, S. (1996). High temperature oxidation behavior of (Ti1-xCrx)N coatings. Thin Solid Films, 287, 188-192.
Popovic´, M., Novakovic´, M. and Bibic´. N. (2015). Annealing effects on the properties of TiN thin films. Processing and Application of Ceramics, 9, 67-71.
Qi, Z.B., Liu, B., Wu, Z,T., Zhu, F.P., Wang, Z.C. and Wu, C.H. (2013). A comparative study of the oxidation behavior of Cr2N and CrN coating. Thin Solid Films, 544, 515-520.
Wittmer, M., Noser, N. and Melchior, H. (1981). Oxidation kinetics of TiN thin films. Journal of Applied Physics,
52, 6659-6664.
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2020-01-15
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บทความวิจัยจากการประชุมวิชาการระดับชาติ"วิทยาศาสตร์วิจัย"ครั้งที่ 11
