Effect of Sputtering Current on the Structure of Vanadium Nitride Thin Films Deposited by Reactive DC Unbalanced Magnetron Sputtering
Abstract
Vanadium nitride thin films were deposited on Si by reactive DC unbalanced magnetron sputtering method. The effect of sputtering current, in the range of 300 – 700 mA, on the structure of the as-deposited films was investigated. The crystal structure, thickness, roughness, surface morphology and chemical composition were characterized by XRD, AFM, FE-SEM and EDS, respectively. The results showed that the as-deposited films had fcc structure with (111), (200), (220) and (311) planes. The thickness and crystal size increase with increasing of the sputtering current. The lattice constant was in the range of 4.120–4.123 Å. The as-deposited films compose of vanadium and nitrogen in different ratios, depending on the sputtering current. Cross section analysis by FE-SEM technique showed a compact columnar structure of the as-deposited films. Keywords : thin film, vanadium nitride, sputtering current, reactive DC unbalanced magnetron sputteringReferences
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Wiklund, U., Casas, B. and Stavlid, N. (2006). Evaporated vanadium nitride as a friction material in dry sliding against stainless steel. Wear, 261, 2–8.
Zhang, S., Deen, S., Youngqing, F. and Hejun, D. (2003). Recent advances of superhard nanocomposited coatings: a review. Surface and Coatings Technology, 167, 113-119.
Fateh, N., Fantalvo, G.A. and Mitterer, C. (2008). Tribological properties of reactive magnetron sputtered V2O5 and VN–V2O5 coatings. Tribology Letters, 30(1), 21-26.
Glaser, A., Surnev, S., Netzer, F.P., Fateh, N., Fontalvo, G.A. and Mitterer, C. (2007). Oxidation of vanadium nitride and titanium nitride coating. Surface Science, 601, 1153-1159.
Gueddaoui, H., Schmerber, G., Abes, M., Guemmez, M. and Parlebas, J.C. (2006). Effects of experimental parameters on the physical properties of non-stoichiometric sputtered vanadium nitrides films. Catalysis Today, 113, 270-274.
Lim, J.W., Park, J.S. and Kang, S.W. (2000). Kinetic Modeling of Film Growth Rates of TiN Films in Atomic Layer Deposition. Journal of Applied Physics, 87, 4632-4634.
Liu, X., Huibin, L., Meng, H., Kuijuan, J., Guozhen, Y., Hao, N. and Kun, Z. (2014). Epitaxial growth of vanadium nitride thin films by laser molecule beam epitaxy. Materials Letters, 123, 38–40.
Liu, Y.M., Han, R.Q., Liu, F., Pei, Z.I. and Sun, C. (2017). Sputtering gas pressure and target power dependence on the microstructure and properties of DC-magnetron sputtered AlB2-type WB2 films. Journal of Alloys and Compounds, 703, 188–197.
Lugscheider, E., Knotek, O., Bobzin, K. and Barwulf, S. (2000). Tribological properties, phase generation and high temperature phase stability of tungsten- and vanadium-oxides deposited by reactive MSIP-PVD process for innovative lubrication applications. Surface and Coatings Technology, 133–134,
362-368.
Ma, C.H., Huang, J.H. and Chen, H. A. (2000). Study of preferred orientation of vanadium nitride and zirconium nitride coatings on silicon prepared by ion beam assisted deposition. Surface and Coatings Technology, 133–134, 289–94.
Okimura, K., (2001). Low temperature growth of rutile TiO2 films in modified rf magnetron sputtering. Surface and Coatings Technology, 135, 286-290.
Oyama, S.T. (1992) Kinetics of ammonia decomposition on vanadium nitride. Journal of Catalysis, 133(2), 358-369.
Qu, X.P., Zhou, M., Chen, T., Xie, Q., Ru, G.P., and Li, B.Z. (2006). Study of ultrathin vanadium nitride as diffusion barrier for copper interconnect. Microelectronic Engineering, 83(2), 236-240.
Shi, P.Z., Wang, J., Tian, C.X., Li, Z.G., Zhang, G.D., Fu, D.J., Yang, B., et al. (2013). Structure, mechanical and tribological properties of CrN thick coatings deposited by circular combined tubular arc ion plating. Surface and Coatings Technology, 288, S534-S537.
Sun, Q. and Fu, Z. W. (2008). Vanadium nitride as a novel thin film anode material for rechargeable lithium batteries. Electrochimica Acta, 54, 403-409.
Thornton, J.A., (1978). Substrate heating in cylindrical magnetron sputtering sources. Thin Solid Films, 54(1), 23-31.
Vyas, A., Shen, Y.G., Zhou, Z.F., and Li, K.Y. (2008). Nano-structured CrN/CNx multilayer films deposited by magnetron sputtering. Composites Science and Technology, 68, 2922-2929.
Wiklund, U., Casas, B. and Stavlid, N. (2006). Evaporated vanadium nitride as a friction material in dry sliding against stainless steel. Wear, 261, 2–8.
Zhang, S., Deen, S., Youngqing, F. and Hejun, D. (2003). Recent advances of superhard nanocomposited coatings: a review. Surface and Coatings Technology, 167, 113-119.
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2017-09-13
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บทความวิจัยจากการประชุมวิชาการระดับชาติ"วิทยาศาสตร์วิจัย"ครั้งที่ 9
