Preparation and characterization of CrVN thin films deposited by reactive dc magmetron co-sputtering
Authors
Sitthiwat Unchit
Department of physic , Faculty of science , Burapha University, Chonburi, Thailand ,20131
Surasing Chaiyakun
Department of physic , Faculty of science , Burapha University, Chonburi, Thailand ,20131
Adisorn Buranawong
Department of physic , Faculty of science , Burapha University, Chonburi, Thailand ,20131
Abstract
Chromium vanadium nitride (CrVN) thin film was deposited by reactive DC magnetron co-sputtering method on glass slide and silicon. The effect of vanadium sputtering current (IV) on the crystal structure, surface morphology and thickness of thin film were investigated by XRD and AFM techniques, respectively. The result show that the influence of vanadium sputtering current has dominate the crystal structure , surface morphology and thickness of thin film. The as-deposited films were compose of CrVN with (111), (200), (220) planes. The roughness and thickness of the as-deposited films were in the range of 883 to 1048 nm and 3.75 to 4.96 nm, respectively.
Author Biography
Sitthiwat Unchit, Department of physic , Faculty of science , Burapha University, Chonburi, Thailand ,20131
